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Overview

Plasma technology

EN2CORE’s Plasma Source:

Power, Precision, and Reliability

Through our proprietary coil geometry and materials integration, our plasma source generates a highly stable, efficient discharge with exceptional density and thermal characteristics.

Built for the most advanced applications in semiconductor manufacturing and clean energy systems.

High Reactivity

Maximized Radical Generation

Produces a dense population of excited species and radicals to drive high-efficiency surface and gas-phase reactions—crucial for both atomic-scale deposition/etching (ALD/ALE) and energy-fuel reforming.

>6,000ºK

Ultra-Hot Core

Thermal Power For Extreme Applications

Generates and sustains extreme plasma temperatures—unlocking high-yield chemical reactions for thermochemical conversion, material decomposition, and advanced energy systems.

CH4
H2
N2
CxFy
CO2
Ar
NH3
O2
NF3

5

PRESSURE

8

FLOW

6

POWER

Highly Stable Plasma Discharge

Reliability Under Real-World Conditions

Maintains consistent plasma characteristics across wide ranges of gas chemistries, pressure, flow, and power—delivering stable, low-variance performance even in the most complex process environments.